发明名称 |
Substrate processing apparatus |
摘要 |
Provided is a substrate processing apparatus. The substrate processing apparatus includes a reaction tube, a substrate holder, a gas nozzle, a heating unit, a temperature detector, and an exhaust unit. The reaction tube accommodates and processes substrates. The substrate holder holds substrates stacked at predetermined intervals in the reaction tube. The gas nozzle is installed along a stacked direction of the substrates. The heating unit heats the substrates. The temperature detector is installed along the stacked direction of the substrates. The exhaust unit exhausts an inside atmosphere of the reaction tube. Each of the gas nozzle and the temperature detector includes first and second parts and is supported by a narrow tube supporting member including first and second supporting parts. The first supporting part makes contact with the first part. The second supporting part is parallel with the second part and supports the second part. |
申请公布号 |
US8070880(B2) |
申请公布日期 |
2011.12.06 |
申请号 |
US20080255246 |
申请日期 |
2008.10.21 |
申请人 |
MARUBAYASHI TETSUYA;INOKUCHI YASUHIRO;HITACHI KOKUSAI ELECTRIC, INC. |
发明人 |
MARUBAYASHI TETSUYA;INOKUCHI YASUHIRO |
分类号 |
C23C16/455;C23C16/06;C23C16/22;C23C16/458;C23C16/46;C23F1/00;H01L21/306 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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