DISPLAY DEVICE AND METHOD FOR FABRICATING OF THE SAME

摘要

PURPOSE: A display device and a manufacturing method thereof are provided to attain low resistance wiring by forming various kinds of wire in a thin film transistor after a thermal process. CONSTITUTION: A semiconductor layer is respectively formed in a first area(A) and a second part(B) of a substrate. The semiconductor layer comprises a channel region and a source/drain region. A gate insulating layer is formed in the semiconductor layer and is formed in a region corresponding to each channel region. A source/drain electrode touches each source/drain region of the semiconductor layer. A pixel electrode is formed in the same layer as the source/drain electrode and is formed in a third region. An inter-layer insulating film is formed on the front side of the substrate which includes the source/drain electrode and the pixel electrode. A gate line is electrically connected to a gate electrode on the first area through a via contact hole.