发明名称 SEMICONDUCTOR CARRIER APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To restrain disturbance of an air flow and adhesion of a foreign matter onto a wafer thereby, which may occur when a semiconductor carrier apparatus gets access to an external unit. <P>SOLUTION: A down flow from a fan filter unit 4 makes an air quantity in a semiconductor carrier apparatus 2 as indicated by an arrow 24. When a shutter 22 is opened, an air flow is disturbed, depending on a state in a chamber of a semiconductor manufacturing apparatus 1, and air flows occur as indicated by arrows 25, 26, 27, and a wafer 6 in a wafer casette 5 may be contaminated thereby. Accordingly, an air quantity measuring instrument 23 is installed on the top face and bottom face of a robot arm 29; disturbances 25, 26 of the air flows are detected; and a shutter 21 is closed, thus preventing a foreign matter from adhering to the wafer 6. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011243759(A) 申请公布日期 2011.12.01
申请号 JP20100114917 申请日期 2010.05.19
申请人 HITACHI HIGH-TECH CONTROL SYSTEMS CORP 发明人 TANABE OSAMU
分类号 H01L21/677 主分类号 H01L21/677
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