| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a Cu-Ga alloy material with a small amount of a segregation phase, sputtering target, and a method of producing a Cu-Ga alloy material. <P>SOLUTION: The Cu-Ga alloy material has an average composition comprising, by weight, not less than 32% and not more than 53% of gallium (Ga) and the balance being copper (Cu) and inevitable impurities. In the Cu-Ga alloy material, a region containing less than 47% of copper and inevitable voids accounts for 2% or less by volume of the whole Cu-Ga alloy material. <P>COPYRIGHT: (C)2012,JPO&INPIT |
