发明名称 METHOD AND APPARATUS FOR INSPECTING SEMICONDUCTOR USING ABSORBED CURRENT IMAGE
摘要 Provided is an apparatus for automatically detecting a failure position on a specified wiring line. The apparatus and a method for automatically detecting the failure position even on a long wiring line by applying a probe and an electron beam onto a sample and using an image of the current absorbed by the sample are provided. The apparatus obtains an absorbed current image, while laterally moving at right angle with the probe applied onto the sample, and based on the obtained absorbed current image, correction is performed by means of both an image shift and a stage. Countermeasures are taken, using a stage not having a sample rotating stage, against factors including a hardware factor of not moving at a correct angle, such as backlash, the wiring line is accurately and continuously displayed even when the apparatus moves to the ends of the long wiring line, and the failure position is detected, while the apparatus automatically reciprocates several times between the both ends of the wiring line.
申请公布号 US2011291692(A1) 申请公布日期 2011.12.01
申请号 US201013147759 申请日期 2010.01.20
申请人 ANDO TOHRU;KOMORI MASAAKI;MATSUURA TAKAO 发明人 ANDO TOHRU;KOMORI MASAAKI;MATSUURA TAKAO
分类号 G01R31/26 主分类号 G01R31/26
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