SYSTEM AND METHOD FOR CONTROLLED ELECTROSPRAY DEPOSITION

摘要

The present invention is directed to a system and method for controlled electrospray deposition. The system comprises an electrospray apparatus and substrate including a plurality of exposed portions of one or more conductive elements electrically insulated from one another by an insulating element. During operation, the system may be used to deposit a plurality of small sample spots on the substrate surface to facilitate high through-put analysis. Also disclosed are substrates suitable for use in the system and method of the invention.