| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an efficient inspection system for a sample surface. <P>SOLUTION: The system includes a surface flattening mechanism flattening the surface of a sample, a resistance film coating mechanism forming a resistance film on the sample, and a surface inspecting mechanism evaluating the sample surface. The surface inspecting mechanism includes a UV ray source 30, an optical system guiding electromagnetic waves oblique to the sample surface, a mapping optical system 40 guiding electrons emitted from the sample surface to a direction perpendicular to the sample surface, a detector 50, and an image forming/signal processing circuit 60. The mapping optical system includes three lens systems 41 to 43 and an aperture 44. An X-ray source may be used instead of the UV ray source. Otherwise, a device for guiding an electron beam generated from an electron beam source onto a sample surface may be disposed, and the sample surface may be irradiated with one or both of electromagnetic waves and electron beams by driving one or both of an electromagnetic wave irradiating device and an electron beam irradiating device. <P>COPYRIGHT: (C)2012,JPO&INPIT |
