发明名称 MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS
摘要 A multilayer mirror to reflect radiation having a wavelength in the range of 2-8 nm has alternating layers. The alternating layers include a first layer and a second layer. The first and second layers are selected from the group consisting of: U and B4C layers, Th and B4C layers, La and B9C layers, La and B4C layers, U and B9C layers, Th and B9C layers, La and B layers, U and B layers, C and B layers, Th and B layers, U compound and B4C layers, Th compound and B4C layers, La compound and B9C layers, La compound and B4C layers, U compound and a B9C layers, Th compound and a B9C layers, La compound and a B layers, U compound and B layers, and Th compound and a B layers. An interlayer is disposed between at least one of the first layers and the second layer.
申请公布号 US2011292366(A1) 申请公布日期 2011.12.01
申请号 US201013201242 申请日期 2010.01.11
申请人 GLUSHKOV DENIS ALEXANDROVICH;BANINE VADIM YEVGENYEVICH;SJMAENOK LEONID AIZIKOVITCH;SALASHCHENKO NIKOLAY NIKOLAEVITCH;CHKHALO NIKOLAY IVANOVICH;ASML NETHERLANDS B.V. 发明人 GLUSHKOV DENIS ALEXANDROVICH;BANINE VADIM YEVGENYEVICH;SJMAENOK LEONID AIZIKOVITCH;SALASHCHENKO NIKOLAY NIKOLAEVITCH;CHKHALO NIKOLAY IVANOVICH
分类号 G03B27/54;G02B5/08 主分类号 G03B27/54
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