SEMICONDUCTOR THIN FILM SUBSTRATE, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor thin film substrate having semiconductor layers with different film thicknesses formed out of one semiconductor layer, and to provide a semiconductor device including the semiconductor thin film substrate.

SOLUTION: A manufacturing method of a semiconductor thin film substrate comprises forming a semiconductor layer on a substrate, forming a first island-shaped semiconductor layer and a second island-shaped semiconductor layer by processing the semiconductor layer, and melting the first island-shaped semiconductor layer by irradiating the first island-shaped semiconductor layer with a laser, thereby forming a third island-shaped semiconductor layer with a larger thickness than that of the second island-shaped semiconductor layer out of the first island-shaped semiconductor layer.

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