发明名称 DIELECTRIC-LAYER-COATED SUBSTRATE, AND PROCESS AND INSTALLATION FOR PRODUCING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide new thin film materials that can be used to coat transparent substrates of the glass type, new deposition processes and new installations. <P>SOLUTION: A substrate (1), for example, a glass substrate is coated with at least one thin dielectric layer. The dielectric layer is deposited by means of cathode sputtering, for example, by means of the cathode sputtering which is assisted by a magnetic field and is preferably reactive in the presence of oxygen and/or nitrogen, with exposure to at least one ion beam (3) from an ion source (4). The dielectric layer which is exposed to the ion beam can be crystallized. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011241481(A) 申请公布日期 2011.12.01
申请号 JP20110167008 申请日期 2011.07.29
申请人 SAINT-GOBAIN GLASS FRANCE 发明人 BAUBET CAROLE;FISCHER KLAUS;LOERGEN MARCUS;GIRON JEAN-CHRISTOPHE;NADAUD NICOLAS;MATTMAN ERIC;ROUSSEAU JEAN-PAUL;HOFRICHTER ALFRED;JANSEN MANFRED
分类号 C23C14/22;C03C17/22;C03C17/245;C03C17/36;C23C14/08;C23C14/34;H01L31/04 主分类号 C23C14/22
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