发明名称 |
DEVICE AND PROCESS FOR LIQUID TREATMENT OF A WAFER SHAPED ARTICLE |
摘要 |
A spin chuck in an apparatus for single wafer wet processing has structures at its periphery that, in combination with a supported wafer, form a series of annular nozzles that direct flowing gas from a chuck-facing surface of the wafer, around the edge of the wafer, and exhaust the gas away from the non-chuck- facing surface of the wafer, thereby preventing treatment fluid applied to the non-chuck- facing surface from contacting the edge region of the wafer. Retaining pins with enlarged heads engage the wafer edge and prevent it from being displaced upwardly when a high flow rate of gas is utilized. |
申请公布号 |
WO2011073840(A3) |
申请公布日期 |
2011.12.01 |
申请号 |
WO2010IB55550 |
申请日期 |
2010.12.02 |
申请人 |
LAM RESEARCH AG;LAM RESEARCH CORPORATION;FRANK, DIETER;PUGGL, MICHAEL |
发明人 |
FRANK, DIETER;PUGGL, MICHAEL |
分类号 |
H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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