发明名称 PHOTO-RADICALLY CURABLE RESIN COMPOSITION AND METHOD FOR PRODUCING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a photo-radically curable resin composition which exhibits good surface curability and a good deep-part curability by the irradiation from an ultraviolet light-emitting diode light source of a low light quantity. <P>SOLUTION: Silicone-modified isocyanurates represented by formula (3) are provided. In the formula (3), R<SP POS="POST">1</SP>are each independently a hydrogen atom or a methyl group, R are each independently a methyl group or a phenyl group, n is an integer of 2-1,000, and k is a number of 0-2. The photo-radically curable resin composition contains (A) a silicone-modified isocyanurate represented by the formula (3), (B) a photoradical initiator, and (C) a radical chain transfer agent. A method for producing the composition is also provided. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011241278(A) 申请公布日期 2011.12.01
申请号 JP20100113615 申请日期 2010.05.17
申请人 SHIN-ETSU CHEMICAL CO LTD 发明人 KONDO YOSHIHIRO;TANAKA HAYATO;WAKAO MIYUKI;KASHIWAGI TSUTOMU
分类号 C08G77/388;C08F290/08;C08G77/54 主分类号 C08G77/388
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