发明名称 ELECTRON MICROSCOPE AND OPTICAL AXIS ADJUSTMENT METHOD THEREFOR
摘要 <P>PROBLEM TO BE SOLVED: To provide an electron microscope, capable of automatically adjusting an optical axis even when the optical axis deviates to the extent that an electron beam position cannot be confirmed on a fluorescent plate after the exchange of a electron source. <P>SOLUTION: By measuring a fluorescent plate current, it is decided whether or not the fluorescent plate is irradiated with the electron beam. In case of no irradiation, by the control of a deflector, the electron beam is moved so that the fluorescent plate is irradiated with the electron beam. In case of irradiation, the deflector is controlled to make a maximum magnitude of the current and a maximum magnitude of brightness obtained from an image of the electron beam with which the fluorescent plate is irradiated. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011243470(A) 申请公布日期 2011.12.01
申请号 JP20100115884 申请日期 2010.05.20
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 OYAGI TOSHIYUKI;YOTSUTSUJI TAKAFUMI;NODERA YASUYUKI;NAGAOKI ISAO
分类号 H01J37/04;H01J37/147 主分类号 H01J37/04
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