发明名称 Metal Complexes for Chemical Vapour Deposition of Platinum
摘要 The invention relates to platinum complexes, to a method for preparing the same and to the use thereof for the chemical vapour deposition of metal platinum. The chemical vapour deposition of platinum onto a substrate is made from a platinum organometallic compound that includes a ligand with a cyclic structure including at least two non-adjacent C═C double bonds, and the platinum organometallic compound has a square-plane structure in which the platinum is bonded to each of the C═C double bonds of the ligand, thereby forming a (C═C)—Pt—(C═C) of 60° to 70°.
申请公布号 US2011294672(A1) 申请公布日期 2011.12.01
申请号 US201013144391 申请日期 2010.01.08
申请人 DOPPELT PASCAL;THURIER CYRIL;CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE 发明人 DOPPELT PASCAL;THURIER CYRIL
分类号 C23C16/18;B01J23/42;B05D3/06;B05D5/12;B82Y30/00;B82Y40/00;C07F15/00;H01L39/24 主分类号 C23C16/18
代理机构 代理人
主权项
地址