发明名称 |
Metal Complexes for Chemical Vapour Deposition of Platinum |
摘要 |
The invention relates to platinum complexes, to a method for preparing the same and to the use thereof for the chemical vapour deposition of metal platinum. The chemical vapour deposition of platinum onto a substrate is made from a platinum organometallic compound that includes a ligand with a cyclic structure including at least two non-adjacent C═C double bonds, and the platinum organometallic compound has a square-plane structure in which the platinum is bonded to each of the C═C double bonds of the ligand, thereby forming a (C═C)—Pt—(C═C) of 60° to 70°.
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申请公布号 |
US2011294672(A1) |
申请公布日期 |
2011.12.01 |
申请号 |
US201013144391 |
申请日期 |
2010.01.08 |
申请人 |
DOPPELT PASCAL;THURIER CYRIL;CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE |
发明人 |
DOPPELT PASCAL;THURIER CYRIL |
分类号 |
C23C16/18;B01J23/42;B05D3/06;B05D5/12;B82Y30/00;B82Y40/00;C07F15/00;H01L39/24 |
主分类号 |
C23C16/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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