发明名称 |
SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS, METHOD OF FLATTENING EDGE OF SUBSTRATE AND DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate table which can adjust the flatness of a substrate edge. <P>SOLUTION: A substrate table to support a substrate is disclosed. The substrate table includes a substrate support to support the substrate and to apply a bending force to an edge of the substrate in a first direction. A substrate edge manipulator is provided and is configured to apply a variable bending force to the edge of the substrate in a second direction. The second direction has at least a component opposite in direction to the first direction. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2011243981(A) |
申请公布日期 |
2011.12.01 |
申请号 |
JP20110106085 |
申请日期 |
2011.05.11 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
RAYMOND WILHEMS LEWIS RAFALE;NIEK JACOBUS JOHANNES ROSET;MARTIN HUBEN |
分类号 |
H01L21/027;H01L21/683 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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