发明名称 SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS, METHOD OF FLATTENING EDGE OF SUBSTRATE AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate table which can adjust the flatness of a substrate edge. <P>SOLUTION: A substrate table to support a substrate is disclosed. The substrate table includes a substrate support to support the substrate and to apply a bending force to an edge of the substrate in a first direction. A substrate edge manipulator is provided and is configured to apply a variable bending force to the edge of the substrate in a second direction. The second direction has at least a component opposite in direction to the first direction. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011243981(A) 申请公布日期 2011.12.01
申请号 JP20110106085 申请日期 2011.05.11
申请人 ASML NETHERLANDS BV 发明人 RAYMOND WILHEMS LEWIS RAFALE;NIEK JACOBUS JOHANNES ROSET;MARTIN HUBEN
分类号 H01L21/027;H01L21/683 主分类号 H01L21/027
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