发明名称 WAVEFRONT SHAPE MEASUREMENT METHOD AND WAVEFRONT SHAPE MEASUREMENT DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a wavefront shape measurement method for measuring a surface shape of a large diameter optical system to be inspected and a wavefront shape measurement device for measuring a surface shape of a large diameter optical system to be inspected. <P>SOLUTION: A wavefront shape measurement method for measuring surface shape of an optical system to be inspected comprises: a liquid reflection surface forming step in which a liquid reflection surface (EH) having a rotational paraboloidal shape concave in a gravity direction is formed by spinning a container (YK) containing a liquid (ET) around a rotational axis (KJ) extending in the gravity direction; a disposing step in which a reference plane mirror (KH) having a reference plane (HM) is disposed so as to face the liquid reflection surface; and a measurement step in which light flux having a coherency is irradiated to the liquid reflection surface from an interferometer (KS), the light flux reflected by the liquid reflection surface is reflected by the reference plane mirror, and the light flux returned to the interferometer again via the liquid reflection surface is allowed to interfere to measure the surface shape of the reference plane mirror. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011242347(A) 申请公布日期 2011.12.01
申请号 JP20100116839 申请日期 2010.05.21
申请人 NIKON CORP 发明人 NEGISHI TAKETOSHI
分类号 G01B9/02;G01B11/24 主分类号 G01B9/02
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