PLASMA PROCESSING APPARATUS, SUBSTRATE HOLDING MECHANISM, AND SUBSTRATE POSITION SHIFT DETECTING METHOD

摘要

PROBLEM TO BE SOLVED: To enhance detection precision of a position shift of a substrate by eliminating an effect of pressure loss in a gas passage for heat transfer gas.

SOLUTION: There are provided a gas passage 352 for supplying gas from a gas supply source therethrough to the gap between a mount table 300 and a processing target substrate held on a substrate holding surface of the mount table 300, plural gas holes 354 formed in the substrate holding surface of the mount table to guide the gas from the gas passage onto a substrate holding surface Ls, plural pressure detecting holes 370a to 370b formed at the outside of a gas hole forming area R in the substrate holding surface to detect a pressure applied to the back surface of the substrate, and pressure sensors 380a to 380d connected to the pressure detecting holes. A position shift of the substrate is detected on the basis of the detected pressure from the pressure sensors.

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