| 摘要 |
<P>PROBLEM TO BE SOLVED: To supply a process liquid to a predetermined position on a substrate with high positional precision by an inexpensive method. <P>SOLUTION: In a process liquid supplying method, a template 60 which has plural opening portions 90 formed at places corresponding to predetermined positions on a surface 60a and flow paths 91 intercommunicating from the opening portions 90 formed on the surface 60a to a back surface 60b of the template 60 is mounted on a spin chuck 62 for rotating the template 60 while holding the back surface 60b of the template 60. Then, a process liquid is supplied onto the surface 60a of the template 60, and the spin chuck 62 is rotated to fill the flow paths 91 with the process liquid. An wafer W is brought into close contact with the surface 60a of the template 60 filled with the process liquid, and then the template 60 and the wafer W are turned upside down while keeping the close contact between the template 60 and the wafer W. <P>COPYRIGHT: (C)2012,JPO&INPIT |
