发明名称 |
SUB-RESOLUTION ASSIST FEATURE ARRANGING METHOD AND COMPUTER PROGRAM PRODUCT AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE |
摘要 |
According to a sub-resolution assist feature arranging method in embodiments, it is selected which of a rule base and a model base is set for which pattern region on pattern data corresponding to a main pattern as a type of the method of arranging the sub-resolution assist feature for improving resolution of the main pattern formed on a substrate. Then, the sub-resolution assist feature by the rule base is arranged in a pattern region set as the rule base and the sub-resolution assist feature by the model base is arranged in a pattern region set as the model base.
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申请公布号 |
US2011294239(A1) |
申请公布日期 |
2011.12.01 |
申请号 |
US201113051961 |
申请日期 |
2011.03.18 |
申请人 |
KODAMA CHIKAAKI;KOTANI TOSHIYA;NOJIMA SHIGEKI;MIMOTOGI SHOJI |
发明人 |
KODAMA CHIKAAKI;KOTANI TOSHIYA;NOJIMA SHIGEKI;MIMOTOGI SHOJI |
分类号 |
H01L21/66;G03F1/36;G03F1/68;G03F1/70;G06F17/50;H01L21/027 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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