| 摘要 |
The present invention provides a lithographic apparatus includes a first detection unit for detecting a first mark formed on an original and a second mark formed in each of a plurality of shot regions on a substrate, a second detection unit for detecting the second mark, and a processing unit for performing a process of detecting the second mark by the second detection unit to obtain an array of the shot regions, a process of obtaining a positional relationship between the first mark and the second mark, which are detected by the first detection unit, for each of the shot regions upon moving the substrate using the result of obtaining the array of the shot regions, and a process of transferring a pattern of the original onto each of the shot regions upon aligning the original and the substrate for each of the shot regions based on the positional relationship. |
