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发明名称
PHOTO MASK, METHOD FOR MANUFACTURING THE PHOTO MASK AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE USING THE SAME
摘要
申请公布号
KR101087798(B1)
申请公布日期
2011.11.30
申请号
KR20070098477
申请日期
2007.09.28
申请人
发明人
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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