| 摘要 |
PURPOSE: A method for manufacturing a multi gray scale photo mask and a pattern transfer method are provided to improve accuracy for forming a transfer pattern by improving the accuracy for forming a second resist pattern. CONSTITUTION: The formation area of a light shielding part and the formation area of a half light transmitting part are covered. A first resist pattern(103p), in which a resist film in the formation area of the half light-transmitting part is thicker than the resist film in the formation area of the light shielding part, is formed. Active oxygen is supplied to the first resist pattern and the first resist pattern is coated. A part of the active oxygen, which is supplied to the first resist pattern, is consumed by an exposed half transmissive film.
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