Hard films and sputtering targets for the deposition thereof

摘要

For superior wear resistance to conventional TiN hard films and TiAlN hard films, a hard film contains (Zr 1-a , Hf a ) (C 1-x N x ), wherein "a" and "x" are the atomic ratios of Hf and N, respectively, and satisfy the following conditions: 0.05‰ a‰ 0.4 and 0‰ x‰ 1. Another hard film contains (Zr 1-a-b , Hf a , M b ) (C 1-x N x ), wherein M is at least one of W and Mo; and "a", "b", and "x" are the atomic ratios of Hf, M, and N, respectively, and satisfy the following conditions: 0‰ 1-a-b, 0‰ a, 0.03‰ b‰ 0.35, and 0‰ x‰ 1.