发明名称 Multi-layer circuit assembly and process for preparing the same
摘要 Processes for fabricating a multi-layer circuit assembly and a multi-layer circuit assembly fabricated by such processes are provided. The process includes (a) providing a substrate at least one area of which comprises a plurality of vias, these area(s) having a via density of 500 to 10,000 holes/square inch (75 to 1550 holes/square centimeter); (b) applying a dielectric coating onto all exposed surfaces of the substrate to form a conformal coating thereon; and (c) applying a layer of metal to all surfaces of the substrate. Additional processing steps such as circuitization may be included.
申请公布号 US8065795(B2) 申请公布日期 2011.11.29
申请号 US20070760217 申请日期 2007.06.08
申请人 OLSON KEVIN C.;WANG ALAN G.;PPG INDUSTRIES OHIO, INC 发明人 OLSON KEVIN C.;WANG ALAN G.
分类号 H01K3/22 主分类号 H01K3/22
代理机构 代理人
主权项
地址