发明名称 |
Substrate cleaning apparatus and substrate cleaning method |
摘要 |
A substrate cleaning apparatus, comprises a process tank that holds a mixture containing a hydrogen peroxide solution and sulfuric acid and is used for cleaning a substrate immersed in said mixture; circulation piping that extends between a primary side of said process tank on which said mixture is injected into said process tank and a secondary side of said process tank on which said mixture is discharged from said process tank and has a pump for causing circulation of said mixture; a heater disposed in said circulation piping configured to heat said mixture to a predetermined temperature; a chemical injection pipe configured to inject a hydrogen peroxide solution into said circulation piping at a position between the primary side of said process tank and a secondary side, which is a downstream side, of said heater; and a filter disposed in said circulation piping configured to remove particles in said mixture. |
申请公布号 |
US8066020(B2) |
申请公布日期 |
2011.11.29 |
申请号 |
US20060588393 |
申请日期 |
2006.10.27 |
申请人 |
TOMITA HIROSHI;YAMADA HIROAKI;MIYAZAKI KUNIHIRO;ONODA HAJIME;KABUSHIKI KAISHA TOSHIBA |
发明人 |
TOMITA HIROSHI;YAMADA HIROAKI;MIYAZAKI KUNIHIRO;ONODA HAJIME |
分类号 |
B08B3/00 |
主分类号 |
B08B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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