发明名称 In-plane optical metrology
摘要 A structure that is located adjacent to a measurement target on a substrate is used to convert incident radiation from an optical metrology device to be in-plane with the measurement target. The structure may be, e.g., a grating or photonic crystal, and may include a waveguide between the structure and the measurement target. The in-plane light interacts with the measurement target and is reflected back to the structure, which converts the in-plane light to out-of-plane light that is received by the optical metrology device. The optical metrology device then uses the information from the received light to determine one or more desired parameters of the measurement target. Additional structures may be used to receive light that is transmitted through or scattered by the measurement target if desired.
申请公布号 US8068228(B2) 申请公布日期 2011.11.29
申请号 US20070835206 申请日期 2007.08.07
申请人 FENG YE;NANOMETRICS INCORPORATED 发明人 FENG YE
分类号 G01N21/55 主分类号 G01N21/55
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