发明名称 ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS.
摘要 <p>An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.</p>
申请公布号 NL2006625(A) 申请公布日期 2011.11.29
申请号 NL20112006625 申请日期 2011.04.19
申请人 ASML NETHERLANDS B.V., 发明人 CLAESSENS, BERT;MULDER, HEINE;VEEN, PAUL;ENDENDIJK, WILFRED;BOUMAN, WILLEM;DRIEENHUIZEN, BERT;VERBEECK, JOZEF;DASSEN, MARC;HOLLINK, THIJS
分类号 G03F7/20 主分类号 G03F7/20
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