发明名称 |
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
摘要 |
PURPOSE: A substrate processing apparatus and method are provided to accomplish high throughput while downsizing a footprint. CONSTITUTION: A substrate processing apparatus(10) has a case(12) and an opening is formed in the front side of the case. A cassette receiving stage is installed in the external lower side of the opening. A cassette loader is installed to face with the opening. First and second scalar arms(58, 60) send back two boats. A boat holder(46) is able to move to the lower side of a reaction path(52) and mounts the boat. A first arm supports a boat mount part in order to rotate. A second arm supports the first arm in order to rotate.
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申请公布号 |
KR20110128149(A) |
申请公布日期 |
2011.11.28 |
申请号 |
KR20110047370 |
申请日期 |
2011.05.19 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC. |
发明人 |
SHIBATA KOJI;TANIYAMA TOMOSHI;NAKADA TAKAYUKI |
分类号 |
H01L21/677;H01L21/22 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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