发明名称 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
摘要 PURPOSE: A substrate processing apparatus and method are provided to accomplish high throughput while downsizing a footprint. CONSTITUTION: A substrate processing apparatus(10) has a case(12) and an opening is formed in the front side of the case. A cassette receiving stage is installed in the external lower side of the opening. A cassette loader is installed to face with the opening. First and second scalar arms(58, 60) send back two boats. A boat holder(46) is able to move to the lower side of a reaction path(52) and mounts the boat. A first arm supports a boat mount part in order to rotate. A second arm supports the first arm in order to rotate.
申请公布号 KR20110128149(A) 申请公布日期 2011.11.28
申请号 KR20110047370 申请日期 2011.05.19
申请人 HITACHI KOKUSAI ELECTRIC INC. 发明人 SHIBATA KOJI;TANIYAMA TOMOSHI;NAKADA TAKAYUKI
分类号 H01L21/677;H01L21/22 主分类号 H01L21/677
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