CMP PAD CONDITIONER AND ITS MANUFACTURING METHOD

摘要

PURPOSE: A CMP pad conditioner and a manufacturing method thereof are provided to improve the cutting performance of the CMP pad conditioner by forming diamond grits with a desirable height at a desirable position. CONSTITUTION: A first mask layer with at least one opening is formed on the surface of a metal base material(10). A substrate plating layer(22) is formed on the surface of the metal base material in the opening. The first mask layer is removed from the surface of the metal base material. A second mask layer with a first opening and a second opening is formed on the surface of the metal base material. Diamond grits(30) are arranged on the surface of the substrate plating layer and the meta base material.