发明名称 SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To prevent malfunction of a circuit due to a displacement current which charges or discharges a parasitic capacitor composed of an insulating film between a supporting substrate and an active layer by a dv/dt surge. <P>SOLUTION: On the outer periphery of isolated semiconductor elements constituting a low potential reference circuit LV and a high potential reference circuit HV, an n-type guard ring 42c, and the like, are formed, and a deep n-type diffusion region 42b having the same conductivity type as that of the n-type guard ring buried layer 42c is formed on the buried insulating film 2b side of an active layer 2c. Furthermore, a p-type well 42d, and the like, are formed in an n<SP POS="POST">-</SP>-type layer 42a, and the like, composed of the active layer 2c, and a semiconductor element is formed in the p-type well 42d. Potentials of the n-type guard ring 42c, and the like, and the p-type well 42d, and the like, are fixed to become reverse bias or the same potential, respectively. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011238760(A) 申请公布日期 2011.11.24
申请号 JP20100108529 申请日期 2010.05.10
申请人 DENSO CORP 发明人 SONE HIROKI;YAMADA AKIRA;SAKAI TAKESHI;NAKANO TAKASHI;KATADA MITSUTAKA
分类号 H01L27/08;H01L21/762;H01L21/822;H01L21/8234;H01L27/04;H01L27/06;H01L29/06 主分类号 H01L27/08
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