| 摘要 |
<P>PROBLEM TO BE SOLVED: To enable correct inspection of a track pattern formed on a disk medium in a concentric circular shape, without affected by the vibration of a rotation synchronization shaft of a rotation stage. <P>SOLUTION: A pattern inspection device 1 includes: a rotation stage 14 to mount a disk medium 4 to inspect the track pattern of the disk medium 4 which is pattern rendered by electron beam irradiation on a resist film using the rotation operation in the circumference direction; an irradiation optical system 2 to irradiate the disk medium 4 mounted on the rotation stage 14 with the electron beam; and an electron detector 3 to detect electrons, generated from the disk medium 4 on the rotation stage 14, by the electron beam irradiation from the irradiation optical system 2. The rotation stage is configured of an identical rotation stage to the rotation stage used to rotate the disk medium at pattern rendering on the disk medium 4. <P>COPYRIGHT: (C)2012,JPO&INPIT |
