| 摘要 |
Disclosed is a ceramic coating with improved plasma resistance applied to a plasma processing apparatus. The ceramic coating is formed on a substance applied to a plasma processing apparatus and on the surface of the substance. In addition, the ceramic coating has 13-25 nm/min of a corrosion rate for the plasma formed at 800W power and includes a ceramic coating film with 0.1-1% porosity. Accordingly, surface damage of the ceramic coating, as configured above, can be reduced even if it is exposed to plasma for lengthy periods.
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