| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique advantageous to deciding an effective light source used for fine patterns. <P>SOLUTION: The method has a step for calculating an optical strength distribution including a positive value portion, in which an optical strength has a positive value, and a negative value portion, in which the optical strength has a negative value, as optical strength distribution to be formed on a pupil plane of a lighting optical system, based on a target pattern to be formed on a substrate; a step for temporarily deciding the optical strength distribution including a substitution portion substituted by multiplying an absolute value of the negative value included in the calculated optical strength distribution with a constant t (0<t≥1); a step for calculating images formed on an image surface of a projection optical system during lighting with the temporarily decided optical strength distribution, and a step for determining whether the calculated image satisfies a valuation basis. When it is judges that it satisfies the valuation basis, the temporary decided optical strength distribution is decided as the optical strength distribution to be formed on the pupil face. When it is judges that it does not satisfy the valuation basis, the constant t is changed. <P>COPYRIGHT: (C)2012,JPO&INPIT |
