| 发明名称 |
EXPOSURE APPARATUS, SUBSTRATE CARRYING METHOD, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE |
| 摘要 |
A substrate conveyance device that conveys a substrate having been exposed with a pattern image via a projection optical system and a liquid, the substrate conveyance device comprising: a liquid detector that detects the liquid adhering on the substrate. |
| 申请公布号 |
HK1090174(A1) |
申请公布日期 |
2011.11.25 |
| 申请号 |
HK20060110789 |
申请日期 |
2006.09.28 |
| 申请人 |
NIKON CORPORATION;MIYAGI NIKON PRECISION CO. LTD. |
发明人 |
OHTA, ATSUSHI;HORIUCHI, TAKASHI |
| 分类号 |
G03F;G03F7/20;H01L;H01L21/027 |
主分类号 |
G03F |
| 代理机构 |
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代理人 |
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