发明名称 VACUUM PROCESSING APPARATUS, SUBSTRATE ROTATION APPARATUS, AND DEPOSITION METHOD
摘要 An apparatus for rotating a substrate having a center hole, comprises a pickup member configured to hold the substrate by holding an edge of the center hole, and a driving unit configured to drive the pickup member, wherein the driving unit is configured to insert the pickup member into the center hole so as not to bring the pickup member into contact with the substrate, to drive the pickup member upward so that the pickup member holds the edge of the center hole from below, and thereupon to rotate the pickup member so as to rotate the substrate, and in rotating the substrate, the driving unit rotates the pickup member about a rotation axis which is perpendicular to a principal surface of the substrate and passes through the center of the substrate.
申请公布号 US2011287177(A1) 申请公布日期 2011.11.24
申请号 US201113099535 申请日期 2011.05.03
申请人 YAMADA SATOSHI;ISHIDA MASAAKI;CANON ANELVA CORPORATION 发明人 YAMADA SATOSHI;ISHIDA MASAAKI
分类号 C23C14/50;B05D5/12 主分类号 C23C14/50
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