METHOD AND APPARATUS FOR VERIFYING STITCHING ACCURACY OF STITCHED CHIPS ON A WAFER

摘要

A method for verifying stitching accuracy of a stitched chip on a wafer is disclosed. Initially, a set of test structures are inserted within a reticle layout. An exposure program is executed to control a photolithography equipment having a stepper to perform multiple exposures of the reticle on a wafer to generate a stitched chip on the wafer. Electrical measurements are then performed on the test structures at actual stitch boundaries of the stitched chip to evaluate stitching accuracy of the stitched chip.