发明名称 SUBSTRATE LAMINATING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate laminating method that improves adhering accuracy of a workpiece, such as a semiconductor wafer, and a supporting substrate for reinforcement. <P>SOLUTION: A supported substrate W2 supported through engagement at a circumferential part with a plurality of engaging claws 38 is opposed with each other in the proximity to an adhering surface of both-surface adhesive sheet of a wafer W1. A pressing member 39 constituted with an almost semi-spherical elastic material from almost the center of non-adhering surface of the supported substrate W2 is pressed. Thereby, while the pressing member 39 is elastically deformed to be in flat contact with the front surface of the supported substrate, the supported substrate W2 is adhered to the wafer W1. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011238966(A) 申请公布日期 2011.11.24
申请号 JP20110171921 申请日期 2011.08.05
申请人 NITTO DENKO CORP;NITTO SEIKI CO LTD 发明人 YAMAMOTO MASAYUKI;HASE YUKITOSHI
分类号 H01L21/02;H01L21/68;H01L21/683 主分类号 H01L21/02
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