| 摘要 |
A reflective photomask includes a phase shift portion, a reflective portion located outside the phase shift portion; and a semi-light-absorbing portion located between the phase shift portion and the reflective portion. The semi-light-absorbing portion includes a first multilayer film reflective to exposure light, a first interlayer film, a second multilayer film, a second interlayer film, and a third multilayer film. The phase shift portion is the first multilayer film exposed from the third multilayer film, the second interlayer film, the second multilayer film, the first interlayer film. The reflective portion is the second multilayer film exposed from the third multilayer film and the second interlayer film. |
