RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND

摘要

Disclosed is a radiation-sensitive resin composition which is capable of providing a resist coating film that exhibits excellent drainability on the surface by having a high dynamic contact angle during the exposure in a liquid immersion lithography process, while suppressing occurrence of development defects by being greatly decreased in the dynamic contact angle during the development. The radiation-sensitive resin composition is also capable of reducing the time necessary for change of the dynamic contact angle. Specifically disclosed is a radiation-sensitive resin composition which contains (A) a fluorine-containing polymer that has a structural unit (I) containing a group represented by formula (1), and (B) a radiation-sensitive acid generator.