| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a higher sensitivity inspection method that can solve problems in a conventional pattern inspection method which detects a defect by comparing an inspection image and a reference image and using a defect determination threshold value to a differential value, which has a problem that a false report occurs due to inspection without reference to a location regardless of a fact that a defect usually occurs only in a certain circuit pattern unit, and in which it has been difficult to achieve a high sensitivity inspection. <P>SOLUTION: A high sensitivity inspection is made possible by performing a pattern inspection which comprises steps of preliminarily obtaining a GP image, designating an inspection location and a threshold value map to the GP image on a GUI, setting an identification reference for a defect, obtaining an inspection image, and applying the identification reference to the inspection image to identify the defect. <P>COPYRIGHT: (C)2012,JPO&INPIT |
