发明名称 METHOD OF MANUFACTURING LIQUID DISCHARGE HEAD SUBSTRATE, METHOD OF MANUFACTURING LIQUID DISCHARGE HEAD, AND METHOD OF MANUFACTURING LIQUID DISCHARGE HEAD ASSEMBLY
摘要 A method of manufacturing a liquid discharge head substrate, includes forming an etching mask layer having an opening in a shape corresponding to a plurality of second portions on a second plane of the substrate, forming a recess to be a first portion by etching the substrate through the opening of the etching mask layer from a second plane side of the substrate, and forming the plurality of second portions by etching a portion from a bottom of a first portion to a first plane using the etching mask layer as a mask from the second plane side of the substrate to forma liquid supply port passing through the substrate.
申请公布号 US2011287562(A1) 申请公布日期 2011.11.24
申请号 US201113106593 申请日期 2011.05.12
申请人 KATO MASATAKA;CANON KABUSHIKI KAISHA 发明人 KATO MASATAKA
分类号 H01L21/00 主分类号 H01L21/00
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