| 摘要 |
According to one embodiment, there is provided a electron beam drawing apparatus includes an irradiation module which irradiates a resist coated onto a substrate with a electron beam, and a control module which controls the irradiation module and which acquires the relationship between an irradiation dose of the electron beam and a positional shift amount of a pattern, acquires a reference irradiation dose of the electron beam necessary to form a pattern on the resist, acquires an allowable positional shift amount allowed for the pattern, acquires a limit irradiation dose of the electron beam corresponding to the allowable positional shift amount on the basis of the relationship, acquires a saturated irradiation dose corresponding to a saturated positional shift amount on the basis of the relationship, and controls the irradiation module so as to irradiate all the divided pattern regions with a electron beam sequentially at least once. |
