| 摘要 |
Exposure is performed by controlling an exposure amount applied to a photosensitive resin 23 arranged on a metal film 22, and development is performed to the photosensitive resin 23, and thus a resist 25 provided with an edge section 25b having a tilted surface 25a having a tilt angle α of at least 20° but no more than 60° is formed. Then, a metal wiring is formed by etching the metal film 22 by using the resist 25 as a mask. |
