| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vapor deposition device increasing quality stability and productivity of a vapor deposited film by promoting stabilization of an evaporation amount of a vapor deposition material. <P>SOLUTION: The vapor deposition device includes a film-depositing means irradiating the vapor deposition material disposed in a vacuum chamber with electron beams to evaporate the vapor deposition material to perform vapor deposition on a lower surface of a resin film base material, a vapor deposition material moving means supporting and moving the vapor deposition material in a predetermined direction, a vapor deposition material temperature measuring means measuring a temperature of the lower surface of the vapor deposition material, and a moving speed control means controlling a moving speed of the vapor deposition material moved by the vapor deposition moving means to a first moving speed when a material temperature measured value measured by the vapor deposition material temperature measuring means is less than a reference value and the moving speed of the vapor deposition material moved by the vapor deposition material moving means to a second moving speed higher than the first moving speed when the material temperature measured value is higher than the reference value. <P>COPYRIGHT: (C)2012,JPO&INPIT |
