发明名称 SINTERED MAGNESIUM OXIDE MATERIAL, AND PROCESS FOR PRODUCTION THEREOF
摘要 <p>Disclosed are: a sintered magnesium oxide material which enables the prevention of occurrence of splashing during the formation of a film and rarely causes clogging at a supply inlet of a film formation device; a deposition material for a PDP-protecting film, which comprises the sintered magnesium oxide material; and a process for producing the sintered material. Specifically disclosed is a sintered magnesium oxide material which comprises magnesium oxide, 3 to 50 mass% of an oxide of an element belonging to Group 2A on the periodic table and different from magnesium, and optionally 1000 ppm or less of at least one element selected from the group consisting of aluminum, yttrium, cerium, zirconium, scandium and chromium, and which has a disk-like, elliptical-plate-like, polygonal-plate-like or half-moon-like shape or a cubic or rectangular solid shape having rounded apexes.</p>
申请公布号 WO2011145265(A1) 申请公布日期 2011.11.24
申请号 WO2011JP02133 申请日期 2011.04.11
申请人 TATEHO CHEMICAL INDUSTRIES CO., LTD.;PANASONIC CORPORATION;KAMEI, TADASUKE;TSUJITA, TAKUJI;HASHIMOTO, JUN;SHIMAMURA, TAKAYUKI;GOTO, MASASHI 发明人 KAMEI, TADASUKE;TSUJITA, TAKUJI;HASHIMOTO, JUN;SHIMAMURA, TAKAYUKI;GOTO, MASASHI
分类号 C04B35/04;C23C14/24;H01J9/02;H01J11/02;H01J11/22;H01J11/34;H01J11/40 主分类号 C04B35/04
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