发明名称 UV OZONE CLEANING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a UV ozone-cleaning apparatus improving cleanness in a cleaning object surface and uniformity thereof and facilitating maintenance. <P>SOLUTION: The UV ozone-cleaning apparatus includes two UV units (20A, 20B) in a UV irradiation chamber (10). The UV units are disposed opposite each other so as to have a prescribed interval. A cleaning object (30) gripped by a substrate conveying part (40) is conveyed into the interval. Mixed gas of air as an ozone generation source and inert gas is supplied toward a surface of the substrate (30) conveyed into the UV irradiation chamber (10) from first and second gas supply parts (50A, 50B). A gas discharge part (60) is provided at a bottom part of the apparatus (100), and ozone-containing gas generated in the UV irradiation chamber (10) is discharged to the outside from the gas discharge part (60) through gas discharge paths (80A, 80B) by operations of exhaust units (70A, 70B) provided at an apparatus upper part. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011235210(A) 申请公布日期 2011.11.24
申请号 JP20100106763 申请日期 2010.05.06
申请人 SHIN-ETSU CHEMICAL CO LTD;SHIN-ETSU ENGINEERING CO LTD 发明人 NUMANAMI TSUNEO;MIZUSHIMA TOYOHIRO;ONODA TADAYOSHI
分类号 B08B7/00;H01L21/304 主分类号 B08B7/00
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