| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid processing apparatus which can make a footprint small and does not require provision of a special mechanism for separating exhaust and drainage. <P>SOLUTION: An exhaust/drainage section 6 includes an annular drainage cup 41 configured to mainly take in and drain the process liquid shaken off from a wafer W, and an exhaust cup 42 provided so as to surround the outside of the drainage cup 41 and configured to mainly take in and exhaust gas components from inside and around a rotary cup 3. The rotary cup 3 includes an annular canopy member 32. The drainage cup 41 takes in the process liquid which has been shaken off from the wafer W through discharge holes 33 and 34 formed in the rotary cup 3 at a lower side of the canopy member 32, and drains the process liquid from a drainage port 43. The exhaust cup 42 takes in the gas components around the rotary cup 3 through an introduction port 42b formed in the exhaust cup 42 at an upper side of the canopy member 32, and exhausts the gas components from an exhaust port 45. Liquid-draining from the drainage cup 41 and gas-exhausting from the exhaust cup 42 are performed independently of each other. <P>COPYRIGHT: (C)2012,JPO&INPIT |
