发明名称 PLATING METHOD FOR RESIN USING GRAPHENE THIN LAYER
摘要 <p>PURPOSE: A plating method for resin using a grapheme thin layer is provided to process the surface of resin through an eco-friendly method by omitting an etching process which is essential to an existing resin plating through the forming of a grapheme thin layer on a resin base. CONSTITUTION: A plating method for resin using a grapheme thin layer comprises the following steps. The grapheme thin film is formed on the resin base. The resin base material in which the grapheme thin film is formed is electro-plated. The grapheme thin film coats the oxidation-grapheme dispersion in the resin base. The coated oxidation-grapheme is restored. Before the oxidation-grapheme dispersion is coated in the resin base, the amine radical is formed on the surface of the resin base.</p>
申请公布号 KR20110127018(A) 申请公布日期 2011.11.24
申请号 KR20100046626 申请日期 2010.05.18
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 BA, EAH HYUN;SON, SANG IK;NAM, JAE DO;OH, JOON SUK;LEE, JUN HO;HWANG, TAE SEON
分类号 C25D5/56;C23C14/02;C23C26/02;C25D5/10 主分类号 C25D5/56
代理机构 代理人
主权项
地址