| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a polishing pad having fine and uniform bubbles and increased polishing speed, and to provide the polishing pad obtained by the method. <P>SOLUTION: This method includes a process for preparing a bubble dispersion urethane composition containing an isocyanate compound, an active hydrogen-containing compound and a silicon-based surfactant by a mechanical foaming method, a process for injecting the bubble dispersion urethane composition into a mold, a process for preparing a thermosetting polyurethane foam block by curing the bubble dispersion urethane composition and a process for preparing a thermosetting polyurethane foam sheet by cutting the thermosetting polyurethane foam block. An average hydroxyl value of the active hydrogen containing compound is 260-400 mgKOH/g. The bubble dispersion urethane composition contains 10-40 pts.wt. of a heat storage agent having a melting point of 70-110°C and a hydroxy group or an urethane group in 100 pts.wt. of the active hydrogen containing compound. <P>COPYRIGHT: (C)2012,JPO&INPIT |
