发明名称 METHOD OF MANUFACTURING MICROPATTERN AND SUBSTRATE WITH MICROPATTERN
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a micropattern, which has less mold contamination, excellent in mold releasability and substrate adhesiveness after exposure. <P>SOLUTION: In the method of manufacturing the micropattern, a polymerization initiation activity of a curable composition constituting a layer adjacent to the mold is made higher than the polymerization initiation activity of the curable composition constituting a layer closer to the substrate than the layer. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011235571(A) 申请公布日期 2011.11.24
申请号 JP20100110018 申请日期 2010.05.12
申请人 FUJIFILM CORP 发明人 YONEYAMA HIROYUKI;ANDO TAKESHI
分类号 B29C59/02;G02B5/02;G02F1/1335;G02F1/13357;H01L21/027 主分类号 B29C59/02
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